Dr. Daniel Krähmer
Dr. Daniel Krähmer has a Ph.D. in physics from the University of Ulm, Germany. He is Staff Scientist and Project Leader in the System Design Department of the Lithography Optics Strategic Business Unit of the ZEISS Semiconductor Manufacturing Technology business group. He is an expert in the simulation of lithographic lenses, in particular in the fields of polarization, coating, stray light, and heating effects. He is (co-) author of several publications in international journals and of about 50 patent families.
Carl Zeiss SMT is an associated partner in the ADOPSYS project and will host an ESR of the TU Delft working on “New design methods for reflective imaging systems, in particular EUV lithography”